| April 5, 2005 | |
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| On April 18, 2005, Olympus Corporation (President: Tsuyoshi Kikukawa) will launch the MX51 industrial inspection microscope. Olympus has enhanced the basic optical performance of the new microscope, which supports numerous observation modes to meet the needs of users. The MX51 will be on display at the Semicon Singapore 2005 held in Singapore between May 4 and 6. |
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| Main Features |
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| 1. | Enhanced basic optical performance for improved observation capabilities |
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| 2. | Extensive system expandability to support a wide variety of observation methods |
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| 3. | Easy controls to facilitate specimen movement and observation |
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| Target Applications |
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| Target applications include research, development, manufacturing and quality management in the fields of industrial materials and electronic parts. The MX51 is especially suitable for inspections of semiconductor wafers measuring less than 150mm, and magnetic heads. |
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| Details of Main Features |
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| 1. | Enhanced basic optical performance for improved observation capabilities |
| The illumination efficiency of the objective lens and illuminator has been improved from the viewpoint of optical design. As a result, the MX51 has approximately 4 times greater detection sensitivity than the previous model MX40 in the area of defect detection through darkfield observation, which is an essential capability for an inspection microscope. | |
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| 2. | Extensive system expandability to support a wide variety of observation methods |
| The MX51 is based on the system used in the Olympus PowerBX metallurgical microscopes. The excellent expandability of the observation unit allows the MX51 to support a wider range of observation modes compared with the previous model MX40. Up to five* different reflected-light observation modes are possible with the same microscope (with the BX-URA2 universal reflected-light illuminator fitted). A motorized illuminator is also available, allowing the operator to switch over between brightfield and darkfield observation with a single switch control. | |
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| * Brightfield, darkfield, Nomarski DIC, simple polarizing, fluorescence | |
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| 3. | Easy controls to facilitate specimen movement and observation |
| The clutch lever built into the grip handle allows easy switching between coarse and fine stage movement. A belt drive is used for XY motion, allowing optimized inspection and microscopic examination of large specimens in excess of 100mm (with the MX-SIC6R2 150mm stage fitted). | |
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| Olympus has also designed the MX51 to meet worldwide safety and ergonomic standards, including the SEMI S2/S8 industry standards. | |
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| As for the ESD compatible items, the MX51 microscope stand and 6-inch stage are newly added. | |
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| Main Specifications of the MX51 |
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